发明公开
- 专利标题: Semiconductor memory device and manufacturing method thereof
- 专利标题(中): 半导体存储器件及其制造方法
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申请号: EP98118164.7申请日: 1998-09-24
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公开(公告)号: EP0908954A3公开(公告)日: 1999-07-14
- 发明人: Sunami, Hideo , Itoh, Kiyoo , Shimada, Toshikazu , Nakazato, Kazuo , Mizuta, Hiroshi
- 申请人: Hitachi, Ltd.
- 申请人地址: 6 Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101-8010 JP
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: 6 Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101-8010 JP
- 代理机构: Strehl Schübel-Hopf & Partner
- 优先权: JP274090/97 19971007
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L21/8242
摘要:
A high speed/large capacity DRAM (Dynamic Random Access Memory) is generally refreshed each 0.1 sec because it loses information stored therein due to a leakage current. The DRAM also loses information stored therein upon cutoff of a power source. Meanwhile, a nonvolatile ROM (Read-only Memory) cannot be configured as a high speed/large capacity memory. A semiconductor memory device of the present invention realizes nonvolatile characteristic by shielding a drain functioning as a memory node from a leakage current by a tunnel insulator, and also realizes stable and high speed operation by adding a transistor for reading to a memory cell.
公开/授权文献
- EP0908954B1 Semiconductor memory device and manufacturing method thereof 公开/授权日:2008-01-23
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