发明公开
EP0911299A4 HIGH-RADIATION GLASS BASE COVERING MATERIAL, HIGH-RADIATION GLASS FILM, AND PROCESS FOR THE PRODUCTION OF HIGH-RADIATION GLASS FILM
失效
ON-高度基于玻璃的镀膜材料,高辐射玻璃膜和一种用于生产高辐射玻璃膜
- 专利标题: HIGH-RADIATION GLASS BASE COVERING MATERIAL, HIGH-RADIATION GLASS FILM, AND PROCESS FOR THE PRODUCTION OF HIGH-RADIATION GLASS FILM
- 专利标题(中): ON-高度基于玻璃的镀膜材料,高辐射玻璃膜和一种用于生产高辐射玻璃膜
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申请号: EP98912751申请日: 1998-04-09
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公开(公告)号: EP0911299A4公开(公告)日: 2001-01-10
- 发明人: MATSUNAGA HIROKAZU , IWATA MISAO , KATO SHINJI , YANO KENJI , HORIMI KAZUHIRO , KATO YOSHITSUGU , ISOGAI TAKAMITSU , HIYOSHI MASAKAZU , FUKUI TAKAMITSU
- 申请人: NORITAKE CO LTD
- 专利权人: NORITAKE CO LTD
- 当前专利权人: NORITAKE CO LTD
- 优先权: JP9409597 1997-04-11
- 主分类号: B32B17/06
- IPC分类号: B32B17/06 ; C03C8/14 ; C03C8/16 ; C03C17/00 ; C09C3/06 ; C09D5/33 ; C09D7/12 ; C03C14/00 ; C04B41/50
摘要:
A glass paste containing pigment particles of silicon tetraboride each covered with a silica glass film (silica glass layer) having a silicon dioxide content higher than that of the glass structure present at the interface with the pigment particle and a predetermined thickness. In the glass film formed by applying this glass paste to the surface of a substrate and firing it, a silica glass film (silica glass layer) which is relatively lowered in the reactivity with the pigment particle by virtue of its silicon dioxide content higher than that of the glass structure is formed at the interface between each pigment particle and the glass structure. The use of the glass paste effectively prevents a high-radiation glass film wherein a high-radiation pigment is dispersed in a glass structure from undergoing interfacial reactions between the pigment and the glass structure during production and use thereof.
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