发明公开
EP0924824A3 Semiconductor light emitting device and method for fabricating the same
失效
Lichtemittierende Halbleitervorrichtung und deren Herstellung
- 专利标题: Semiconductor light emitting device and method for fabricating the same
- 专利标题(中): Lichtemittierende Halbleitervorrichtung und deren Herstellung
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申请号: EP99102776.4申请日: 1996-01-18
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公开(公告)号: EP0924824A3公开(公告)日: 2000-03-01
- 发明人: Yokogawa, Toshiya , Yoshii, Shigeo , Sasai, Yoichi
- 申请人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址: 1006, Ohaza Kadoma Kadoma-shi, Osaka 571-8501 JP
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址: 1006, Ohaza Kadoma Kadoma-shi, Osaka 571-8501 JP
- 代理机构: Schwabe - Sandmair - Marx
- 优先权: JP741495 19950120; JP14598695 19950613
- 主分类号: H01S3/19
- IPC分类号: H01S3/19 ; H01S3/085 ; H01L33/00
摘要:
In a II-VI group semiconductor laser, on an n type GaAs substrate, n type ZnSe layer, a multiquantum well layer of a ZnCdSe well layer and a ZnSe barrier layer, and a p type ZnSe layer are deposited in this order. A polycrystalline ZnO layer is provided on both sides of the p type ZnSe layer for constricting current. Multifilm reflecting mirrors, respectively constituted with a polycrystalline SiO 2 layer and a polycrystalline TiO 2 layer, for obtaining laser oscillation are provided on, the p type ZnSe layer as well as on a surface of the n type ZnSe layer exposed by etching the GaAs substrate. Furthermore, a p type AuPd electrode and an n type AuGeNi electrode are respectively provided. Alternatively, on an n type GaAs substrate, an n type ZnSe epitaxial layer, an n type ZnMgSSe cladding layer, an n type ZnSSe optical waveguide layer, a ZnCdSe active layer, a p type ZnSSe optical waveguide layer, a p type ZnMgSSe cladding layer, a p type ZnTe contact layer and a polycrystalline ZnO burying layer are respectively formed. Furthermore, a p type AuPd electrode and an n type In electrode are respectively provided.
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