发明公开
EP0929101A1 Providing dual work function doping
审中-公开
Dotierung zur Erzielung einer doppelten Austrittsarbeit
- 专利标题： Providing dual work function doping
- 专利标题（中）： Dotierung zur Erzielung einer doppelten Austrittsarbeit
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申请号： EP98310525.5申请日： 1998-12-21
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公开(公告)号： EP0929101A1公开(公告)日： 1999-07-14
- 发明人: Bronner, Gary Bela , Gambino, Jeffrey P. , Mandelman, Jack A. , Radens, Carl J. , Tonti, William Robert
- 申请人： International Business Machines Corporation
- 申请人地址： Old Orchard Road Armonk, N.Y. 10504 US
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： Old Orchard Road Armonk, N.Y. 10504 US
- 代理机构： Burrington, Alan Graham Headford
- 优先权： US3106 19980106
- 主分类号： H01L21/8234
- IPC分类号： H01L21/8234 ; H01L21/336 ; H01L21/28 ; H01L21/225
摘要：
Dual work function doping is provided by doping a selected number of gate structures having self-aligned insulating layer on top of the structures through at least one side wall of the gate structures with a first conductivity type to thereby provide an array of gate structures whereby some are doped with the first conductivity type and others of the gate structures are doped with a second and different conductivity type. Also provided is an array of gate structures whereby the individual gate structures contain self-aligned insulating layer on their top portion and wherein some of the gate structures are doped with a first conductivity type and other of the gate structures are doped with a second and different conductivity type.
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