发明公开
EP0940368A1 PROCESS FOR PREPARING In 2?O 3?-SnO 2? PRECURSOR SOL AND PROCESS FOR PREPARING THIN FILM OF In 2?O 3?-SnO 2?
失效
2的生产方法在2→3 0?-Sn0的先驱吗? 及其制备在2→3 0?-Sn0 2的薄膜的制造方法?
- 专利标题: PROCESS FOR PREPARING In 2?O 3?-SnO 2? PRECURSOR SOL AND PROCESS FOR PREPARING THIN FILM OF In 2?O 3?-SnO 2?
- 专利标题(中): 2的生产方法在2→3 0?-Sn0的先驱吗? 及其制备在2→3 0?-Sn0 2的薄膜的制造方法?
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申请号: EP98921798.9申请日: 1998-05-25
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公开(公告)号: EP0940368A1公开(公告)日: 1999-09-08
- 发明人: TOKI, Motoyuki , FUKUI, Toshimi , ASAKUMA, Naoko , FUJII, Takamitsu
- 申请人: KRI International, Inc.
- 申请人地址: 4-1-2, Hiranomachi, Chuo-ku Osaka-shi, Osaka 541 JP
- 专利权人: KRI International, Inc.
- 当前专利权人: KRI International, Inc.
- 当前专利权人地址: 4-1-2, Hiranomachi, Chuo-ku Osaka-shi, Osaka 541 JP
- 代理机构: Goddar, Heinz J., Dr.
- 优先权: JP15301997 19970526; JP18452397 19970624; JP19938997 19970708; JP36804097 19971229
- 国际公布: WO9854094 19981203
- 主分类号: C01G19/00
- IPC分类号: C01G19/00 ; C30B29/22 ; G09F9/30 ; C09D5/24 ; H01B13/00
摘要:
The invention relates to a method for forming a transparent conductive thin film of In 2 O 3 -SnO 2 on a surface of a plastics substrate of less heat resistance other than that of glass, ceramics, etc. When an In 2 O 3 -SnO 2 precursor sol is produced by hydrolyzing and polymerizing a solution containing indium alkoxide and tin alkoxide, either tri-s-butoxyindium or tri-t-butoxyindium is used as the indium alkoxide. water is added to the solution containing indium alkoxide and tin alkoxide at a temperature of not higher than -20°C. The obtained In 2 O 3 -SnO 2 precursor sol is applied to a surface of a substrate to form a gel film, then the gel film is either irradiated with an ultraviolet beam of which wave length is not longer than 360 nm, or irradiated with an ultraviolet beam of which wave length is not longer than 260 nm and further irradiated with a laser beam of which wave length is not longer than 360 nm, to crystallize the gel forming the thin film, whereby an In 2 O 3 -SnO 2 thin film having a conductivity is formed on the surface of the substrate.
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