发明公开
- 专利标题： Patterning device
- 专利标题（中）： Gerätzur Herstellung von Strukturen
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申请号： EP99120594.9申请日： 1999-10-16
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公开(公告)号： EP1001311A1公开(公告)日： 2000-05-17
- 发明人: Biebuyck, Hans , Michel, Bruno , Schmid, Heinz
- 申请人： International Business Machines Corporation
- 申请人地址： New Orchard Road Armonk, NY 10504 US
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： New Orchard Road Armonk, NY 10504 US
- 代理机构： Klett, Peter Michael
- 优先权： EP98121744 19981116
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/20 ; G03F1/14
摘要：
A patterning device is proposed with which incident light is guidable at least partially to at least one cover element which is in contact with the patterning device. The cover element comprises light-sensitive material and is arranged on top of a substrate protrusion element on a surface of a substrate and/or is itself structured on a substrate.
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