发明公开
- 专利标题: Semiconductor laser and a manufacturing method for the same
- 专利标题(中): 半导体激光器和生产工艺
-
申请号: EP00301607.8申请日: 2000-02-29
-
公开(公告)号: EP1035624A2公开(公告)日: 2000-09-13
- 发明人: Fukuhisa, Toshiya , Yoshikawa, Akio
- 申请人: Matsushita Electronics Corporation
- 申请人地址: 1-1, Saiwai-cho Takatsuki-shi, Osaka 569-1193 JP
- 专利权人: Matsushita Electronics Corporation
- 当前专利权人: Matsushita Electronics Corporation
- 当前专利权人地址: 1-1, Saiwai-cho Takatsuki-shi, Osaka 569-1193 JP
- 代理机构: Crawford, Andrew Birkby
- 优先权: JP5502099 19990303
- 主分类号: H01S5/223
- IPC分类号: H01S5/223 ; H01S5/323
摘要:
A semiconductor laser, includes: a first cladding layer; an active layer that is formed on top of the first cladding layer; a second cladding layer that is formed on top of the active layer and has a different type of conductivity to the first cladding layer; an etch-stop layer that is formed on top of the second cladding layer and has a same type of conductivity as the second cladding layer; and a light-confining construction that is formed on top of the etch-stop layer by an etching process. The etch-stop layer has a surface part that contacts the light-confining construction. This surface part is composed of an (Al x Ga 1-x ) y In 1-y P semiconductor, where 0.2≤x
公开/授权文献
- EP1035624B1 Semiconductor laser and a manufacturing method for the same 公开/授权日:2005-10-05
信息查询