发明公开
- 专利标题: Heat-developable photosensitive material
- 专利标题(中): 可热显影的感光材料
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申请号: EP00106072.2申请日: 2000-03-30
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公开(公告)号: EP1041434A1公开(公告)日: 2000-10-04
- 发明人: Goto, Takahiro , Ezoe, Toshihide , Suzuki, Hiroyuki , Sakai, Minoru , Maeda, Hideki , Inoue, Nobuaki , Takasaki, Masaru
- 申请人: FUJI PHOTO FILM CO., LTD.
- 申请人地址: 210 Nakanuma Minami-ashigara-shi Kanagawa-ken, 250-0193 JP
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人地址: 210 Nakanuma Minami-ashigara-shi Kanagawa-ken, 250-0193 JP
- 代理机构: HOFFMANN - EITLE
- 优先权: JP8849699 19990330; JP8970999 19990330; JP9012699 19990330; JP9015299 19990330
- 主分类号: G03C1/498
- IPC分类号: G03C1/498
摘要:
An object of the present invention is to provide a heat-developable photosensitive material of improved fluctuation of photographic performance (sensitivity, Dmin) arisen from fluctuation of development temperature condition (temperature, time) and storage time after heat development. According to the present invention, there is provided a heat-developable photosensitive material, wherein the photosensitive material comprises, on a support, an image-forming layer containing at least (a) non-photosensitive organic silver salt, (b) photosensitive silver halide, (c) a reducing agent, and (d) a binder, and a protective layer on the image-forming layer, polymer latexes are used as binders of the image-forming layer and the protective layer, and the photosensitive material further comprises, on the image-forming layer side, (e) a nucleating agent and (f) one or more compounds represented by the following formula (1):
wherein, in the formula (1), Z 1 and Z 2 each independently represent a halogen atom, X 1 represents a hydrogen atom or an electron withdrawing group, Y 1 represents -CO- group or -SO 2 - group, Q represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent, L represents a linking group, W represents carboxyl group or a salt thereof, slufo group or a salt thereof, phosphoric acid group, hydroxyl group, a quaternary ammonium group, or a polyethyleneoxy group, and n represents 0 or 1.
wherein, in the formula (1), Z 1 and Z 2 each independently represent a halogen atom, X 1 represents a hydrogen atom or an electron withdrawing group, Y 1 represents -CO- group or -SO 2 - group, Q represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent, L represents a linking group, W represents carboxyl group or a salt thereof, slufo group or a salt thereof, phosphoric acid group, hydroxyl group, a quaternary ammonium group, or a polyethyleneoxy group, and n represents 0 or 1.
公开/授权文献
- EP1041434B1 Heat-developable photosensitive material 公开/授权日:2005-11-02
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