发明公开
- 专利标题: SYSTEM FOR THE TREATMENT OF WAFERS
- 专利标题(中): 设备技术处理半导体DISCS
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申请号: EP99902928.3申请日: 1999-01-27
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公开(公告)号: EP1057212A1公开(公告)日: 2000-12-06
- 发明人: SLUIJK, Boudewijn, Gijsbert , DE RIDDER, Christianus, Gerardus, Maria
- 申请人: ASM INTERNATIONAL N.V.
- 申请人地址: P.O. Box 100 3720 AC Bilthoven NL
- 专利权人: ASM INTERNATIONAL N.V.
- 当前专利权人: ASM INTERNATIONAL N.V.
- 当前专利权人地址: P.O. Box 100 3720 AC Bilthoven NL
- 代理机构: Jorritsma, Ruurd
- 优先权: NL1008143 19980127
- 国际公布: WO9938199 19990729
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Installation for treatment of wafers in a reactor. To that end a series of wafers is placed in a wafer rack and fed into the reactor. Transport into and out of the reactor, which is sited in an enclosed chamber, takes place with the aid of conveyor means. The wafers are transferred from the wafer rack to one or more cassettes. During this operation the wafer rack is always in the vertical position, that is to say the wafers are horizontal. The same preferably also applies to the cassettes, so that the wafers remain horizontal throughout the entire process.
公开/授权文献
- EP1057212B1 SYSTEM FOR THE TREATMENT OF WAFERS 公开/授权日:2004-03-31
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