发明公开
EP1068945A3 Micro-shape transcription method, micro-shape transcription apparatus, and optical-component manufacture method
有权
Mikroherstellungsverfahren,Mikroherstellungsvorrichtung und Verfahren zur Herstellung von Optischen Komponenten
- 专利标题: Micro-shape transcription method, micro-shape transcription apparatus, and optical-component manufacture method
- 专利标题(中): Mikroherstellungsverfahren,Mikroherstellungsvorrichtung und Verfahren zur Herstellung von Optischen Komponenten
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申请号: EP00114317.1申请日: 2000-07-04
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公开(公告)号: EP1068945A3公开(公告)日: 2003-01-29
- 发明人: Korenaga, Tsuguhiro , Umetani, Makoto , Asakura, Hiroyuki
- 申请人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址: 1006, Ohaza Kadoma Kadoma-shi, Osaka 571-8501 JP
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址: 1006, Ohaza Kadoma Kadoma-shi, Osaka 571-8501 JP
- 代理机构: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权: JP19961699 19990713
- 主分类号: B29D11/00
- IPC分类号: B29D11/00 ; B29C59/00
摘要:
A micro-shape transcription method has preparing a mold (13) having a transcription face on which a concavo-convex pattern is formed, pressing the transcription face against a base material (14) softened by heating, then forcibly separating the mold from the base material to transcribe a reverse pattern of the concavo-convex pattern to the surface of the base material, wherein when assuming a temperature for pressing the mold against the base material as T 1 (°C), a temperature for separating the mold from the base material as T 2 (°C), thermal expansion coefficients of the mold and the base material as α a and α b , and the maximum distance between the transcription center of the transcription face and the concavo-convex pattern as d (mm), the following relations (1) and (2):T1 ≥ T2|αa - αb|·(T1 - T2)·d ≤ 4 × 10-2 are simultaneously satisfied.
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