发明授权
- 专利标题: NITRIDE SEMICONDUCTOR LASER DEVICE
- 专利标题(中): 氮化物半导体激光装置
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申请号: EP00906695.2申请日: 2000-03-03
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公开(公告)号: EP1168539B1公开(公告)日: 2009-12-16
- 发明人: KOZAKI, Tokuya Nichia Corporation , SANO, Masahiko Nichia Corporation , NAKAMURA, Shuji Nichia Corporation , NAGAHAMA, Shinichi Nichia Corporation
- 申请人: Nichia Corporation
- 申请人地址: 491-100, Oka, Kaminaka-cho, Anan-shi, Tokushima 774-8601 JP
- 专利权人: Nichia Corporation
- 当前专利权人: Nichia Corporation
- 当前专利权人地址: 491-100, Oka, Kaminaka-cho, Anan-shi, Tokushima 774-8601 JP
- 代理机构: Vossius & Partner
- 优先权: JP5721199 19990304; JP15764699 19990604; JP16349999 19990610; JP16350099 19990610
- 国际公布: WO2000052796 20000908
- 主分类号: H01S5/22
- IPC分类号: H01S5/22
摘要:
A nitride semiconductor laser element enhanced in transverse-mode stability and service life characteristics at a high output so as to be available as a light source for reading from and writing to a large-capacity medium, the element comprising an active layer, a p-side clad layer and a p-side contact layer, all laminated in that order, wherein a stripe-like waveguide area is formed by etching from the p-side contact layer side, which area has a width of 1 to 3 νm and a depth extending from below a position where the film thickness of the p-side clad layer is 0.1 νm to above a luminous layer. Specially, a nitride semiconductor laser element improved in an aspect ratio in a far-field pattern, wherein a p-side optical guide layer has a stripe-like projection, a p-type nitride semiconductor layer overlies the projection, and the p-side optical guide layer's projection has a film thickness of up to 1 νm, the p-side optical guide layer being characterized by being larger in film thickness than an n-side optical guide layer.
公开/授权文献
- EP1168539A1 NITRIDE SEMICONDUCTOR LASER ELEMENT 公开/授权日:2002-01-02
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