发明公开
- 专利标题： Underwater laser processing apparatus and underwater laser processing method
- 专利标题（中）： 水下设备和用于激光治疗水下方法
-
申请号： EP01122593.5申请日： 2001-09-26
-
公开(公告)号： EP1199127A2公开(公告)日： 2002-04-24
- 发明人: Tamura, Masataka , Kimura, Seiichiro , Motora, Yuuichi , Takahashi, Hidenori
- 申请人： Kabushiki Kaisha Toshiba
- 申请人地址： 1-1, Shibaura 1-chome Minato-ku, Tokyo 105 JP
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： 1-1, Shibaura 1-chome Minato-ku, Tokyo 105 JP
- 代理机构： HOFFMANN - EITLE
- 优先权： JP2000295818 20000928
- 主分类号： B23K26/12
- IPC分类号： B23K26/12 ; B23K26/14
摘要：
An underwater laser processing apparatus (100) includes an optical unit (3) and a nozzle (29). The optical unit irradiates a condensed laser beam generated by a YAG laser oscillator (35) to a certain point on a underwater workpiece (6). The nozzle has a gas exit for supplying a gas to the certain point. In the nozzle, an area surrounding the gas exit (25) extends to the surface of the workpiece. This area keeps the supplied gas between the nozzle and the workpiece to improve the underwater laser process.
公开/授权文献
信息查询
