发明公开
EP1202328A3 Quartz glass wafer support jig and method for producing the same
审中-公开
Waferhaltevorrichtung aus Quarglass und Verfahren zu ihrer Herstellung
- 专利标题: Quartz glass wafer support jig and method for producing the same
- 专利标题(中): Waferhaltevorrichtung aus Quarglass und Verfahren zu ihrer Herstellung
-
申请号: EP01125853.0申请日: 2001-10-30
-
公开(公告)号: EP1202328A3公开(公告)日: 2006-05-31
- 发明人: Saito, Makoto , Konno, Toshiaki
- 申请人: Heraeus Quarzglas GmbH & Co. KG , SHIN-ETSU QUARTZ PRODUCTS CO., LTD. , Yamagata Shin-Etsu Quartz Co. Ltd.
- 申请人地址: Quarzstrasse 63450 Hanau DE
- 专利权人: Heraeus Quarzglas GmbH & Co. KG,SHIN-ETSU QUARTZ PRODUCTS CO., LTD.,Yamagata Shin-Etsu Quartz Co. Ltd.
- 当前专利权人: Heraeus Quarzglas GmbH & Co. KG,SHIN-ETSU QUARTZ PRODUCTS CO., LTD.,Yamagata Shin-Etsu Quartz Co. Ltd.
- 当前专利权人地址: Quarzstrasse 63450 Hanau DE
- 代理机构: Grimm, Ekkehard
- 优先权: JP2000334022 20001031
- 主分类号: H01L21/68
- IPC分类号: H01L21/68 ; C23C14/50 ; F27D5/00 ; H01L21/00
摘要:
An object of the present invention is to provide a novel wafer support jig and a process for producing the same, said wafer support jig capable of considerably suppressing the generation of particles in the wafer heat treatment process, e.g., a CVD process, during the production of semiconductors. In order to solve the problems a quartz glass wafer support jig is suggested comprising a plurality of support pillars having provided thereto a plurality of ring-shaped support plates for mounting thereon the wafers, said support plates being superposed one after another with a predetermined distance taken between the neighboring plates in the vertical direction, a quartz glass wafer support jig characterized in that it comprises said ring-shaped support plates each having its upper and lower surfaces precisely polished and each having provided with chamfered portions formed by chamfering the upper and lower edge portions of the outer and inner peripheries thereof.
公开/授权文献
信息查询
IPC分类: