发明公开
EP1227313A3 Surface plasmon resonance measuring chip and method of manufacture thereof
审中-公开
芯片通过表面等离子体共振测量,以及它们的制备方法
- 专利标题: Surface plasmon resonance measuring chip and method of manufacture thereof
- 专利标题(中): 芯片通过表面等离子体共振测量,以及它们的制备方法
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申请号: EP02001783.6申请日: 2002-01-25
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公开(公告)号: EP1227313A3公开(公告)日: 2004-05-19
- 发明人: Naya, Masayuki , Kubo, Takashi , Ito, Takashi , Nomura, Yoshimitsu
- 申请人: FUJI PHOTO FILM CO., LTD. , Fuji Photo Optical Co., Ltd.
- 申请人地址: 210 Nakanuma Minamiashigara-shi Kanagawa-ken, 250-01 JP
- 专利权人: FUJI PHOTO FILM CO., LTD.,Fuji Photo Optical Co., Ltd.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.,Fuji Photo Optical Co., Ltd.
- 当前专利权人地址: 210 Nakanuma Minamiashigara-shi Kanagawa-ken, 250-01 JP
- 代理机构: Klunker . Schmitt-Nilson . Hirsch
- 优先权: JP2001016632 20010125; JP2001299568 20010928
- 主分类号: G01N21/55
- IPC分类号: G01N21/55 ; G01N21/21 ; B29C45/56
摘要:
A surface plasmon resonance measuring apparatus is provided with a dielectric block (11), a metal film (12) formed on a surface (11a) of the dielectric block, a light source (31) for emitting a light beam (30), an optical system (32) for making the light beam enter the dielectric block at various angles of incidence so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer, and a photodetector (40) for detecting the intensity of the light beam satisfying total internal reflection at the interface. In the measurement chip to be utilized in the surface plasmon resonance measuring apparatus, the dielectric block is formed from a synthetic resin in which, when said light beam is p-polarized outside said dielectric block and then strikes the interface, the intensity of a s-polarized component at the interface is 50% or less of the intensity of the light beam at the interface.
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