发明公开
- 专利标题: Master medium cleaning method
- 专利标题(中): Urmedium清洗方法
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申请号: EP02010254.7申请日: 2002-05-17
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公开(公告)号: EP1258885A3公开(公告)日: 2003-09-03
- 发明人: Kamatani, Akito , Nishikawa, Masakazu
- 申请人: FUJI PHOTO FILM CO., LTD.
- 申请人地址: 210 Nakanuma Minami-Ashigara-shi Kanagawa 250-01 JP
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人地址: 210 Nakanuma Minami-Ashigara-shi Kanagawa 250-01 JP
- 代理机构: HOFFMANN - EITLE
- 优先权: JP2001148640 20010518; JP2001206446 20010706; JP2001302236 20010928
- 主分类号: G11B23/50
- IPC分类号: G11B23/50 ; G11B5/86 ; G11B7/26
摘要:
The foreign matter (P1,P2) adhered to the data bearing surface (2a,2b) of a master medium (2) is removed by use of a dry, non-contact removal process, so as to facilitate the performance of a high transfer quality magnetic transfer. Before performing a magnetic transfer or forming an optical disk, a magnetic transfer master medium or an optical disk master medium is placed in a vacuum chamber (3). The vacuum chamber is evacuated by an evacuating means (4), and a reactive gas is introduced thereto by a gas introducing means (6). In the state in which the chamber has been evacuated and the reactive gas has been introduced thereto, a discharging means (5) applies a discharge voltage in the chamber, causing a plasma discharge to be generated between the master medium (2) and an electrode (52). The plasma etching action of the plasma discharge burns off the foreign matter adhered to the surface of the master medium.
公开/授权文献
- EP1258885B1 Master medium cleaning method 公开/授权日:2008-04-16
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