发明公开
EP1278205A2 Method of fabricating near-field light-generating element
有权
Verfahren zur Herstellung lichterzeugender Nahfeld-Elemente
- 专利标题： Method of fabricating near-field light-generating element
- 专利标题（中）： Verfahren zur Herstellung lichterzeugender Nahfeld-Elemente
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申请号： EP02255008.1申请日： 2002-07-16
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公开(公告)号： EP1278205A2公开(公告)日： 2003-01-22
- 发明人: Kasama, Nobuyuki , Oumi, Manabu , Mitsuoka, Yasuyuki , Kato, Kenji , Maeda, Hidetaka , Niwa, Takashi , Shinohara, Yoko
- 申请人： Seiko Instruments Inc.
- 申请人地址： 8, Nakase 1-chome, Mihama-ku Chiba-shi, Chiba JP
- 专利权人： Seiko Instruments Inc.
- 当前专利权人： Seiko Instruments Inc.
- 当前专利权人地址： 8, Nakase 1-chome, Mihama-ku Chiba-shi, Chiba JP
- 代理机构： Sturt, Clifford Mark
- 优先权： JP2001214732 20010716
- 主分类号： G12B21/06
- IPC分类号： G12B21/06
摘要：
A method of fabricating a near-field light-generating element having a minute scattering body inside an aperture, the scattering body producing plasmons by being illuminated with light, includes a step of forming minute scattering bodies 101 periodically arranged on a substrate, a step of selecting the periodically arranged minute scattering bodies 102 except for only one minute scattering body, and a step of forming the aperture 103 such that the single minute scattering body is placed inside the aperture.
公开/授权文献
- EP1278205B1 Method of fabricating near-field light-generating element 公开/授权日：2007-08-22
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