- 专利标题： PROCESS FOR PRODUCING INTEGRATED CIRCUITS
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申请号： EP01934057.9申请日： 2001-05-15
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公开(公告)号： EP1282911B1公开(公告)日： 2018-09-05
- 发明人: SOININEN, Pekka, Juha , ELERS, Kai-Erik
- 申请人： ASM INTERNATIONAL N.V.
- 申请人地址： Jan van Eycklaan 10 3723 BC Bilthoven NL
- 专利权人： ASM INTERNATIONAL N.V.
- 当前专利权人： ASM INTERNATIONAL N.V.
- 当前专利权人地址： Jan van Eycklaan 10 3723 BC Bilthoven NL
- 代理机构： Seppo Laine Oy
- 优先权： FI20001163 20000515
- 国际公布： WO2001088972 20011122
- 主分类号： H01L21/321
- IPC分类号： H01L21/321 ; H01L21/02 ; H01L21/768 ; H01L21/285 ; H01L21/3105
摘要：
This invention concerns a process for producing integrated circuits containing at least one layer of elemental metal which during the processing of the integrated circuit is at least partly in the form of metal oxide, and the use of an organic compound containing certain functional groups for the reduction of a metal oxide layer formed during the production of an integrated circuit. According to the present process the metal oxide layer is at least partly reduced to elemental metal with a reducing agent selected from organic compounds containing one or more of the following functional groups: alcohol (-OH), aldehyde (-CHO), and carboxylic acid (-COOH).
公开/授权文献
- EP1282911A1 PROCESS FOR PRODUCING INTEGRATED CIRCUITS 公开/授权日：2003-02-12
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