发明公开
EP1320902A4 THE SEMICONDUCTOR LED DEVICE AND PRODUCING METHOD 有权
HELLBLEITER-LED-BAUELEMENT UND HERSTELLUNGSVERFAHREN

THE SEMICONDUCTOR LED DEVICE AND PRODUCING METHOD
摘要:
The present invention provides a semiconductor device with InxGal-xN crystal passivation layer and manufacturing method thereof which effectively blocks the leakage current between the surface and boundary of a device and a pn-junction boundary, and enhances the light emission efficiency as forming new structural semiconductor devices by removing the conventional dielectric passivation layer and using InxGal-xN crystal layer instead. A semiconductor device with gallium nitride type crystal passivation layer, wherein said semiconductor device has a p-n junction diode construction and forms an InxGal-xN crystal passivation layer with a specified thickness and a width around the edge of the upper surface of p-GaN layer which is the top layer of the semiconductor device.
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