发明公开
- 专利标题: METHOD FOR ELECTROLESS NICKEL PLATING
- 专利标题(中): 方法的化学镀镍
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申请号: EP01992803.5申请日: 2001-10-04
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公开(公告)号: EP1343921A1公开(公告)日: 2003-09-17
- 发明人: BRANDES, Mariola , MIDDEKE, Hermann , DYRBUSCH, Brigitte
- 申请人: ATOTECH Deutschland GmbH
- 申请人地址: Erasmusstrasse 20 10553 Berlin DE
- 专利权人: ATOTECH Deutschland GmbH
- 当前专利权人: ATOTECH Deutschland GmbH
- 当前专利权人地址: Erasmusstrasse 20 10553 Berlin DE
- 代理机构: Effert, Bressel und Kollegen
- 优先权: DE10054544 20001101
- 国际公布: WO02036853 20020510
- 主分类号: C23C18/16
- IPC分类号: C23C18/16 ; C23C18/20 ; C23C18/24 ; C23C18/28 ; C23C18/32 ; C23C18/34 ; C23C18/44 ; C23C18/50 ; C23C18/18
摘要:
A method for electroless metal plating of substrates, more specifically with electrically non-conductive surfaces, by which the substrates may be reliably metal plated at low cost under manufacturing conditions as well and by means of which it is possible to selectively coat the substrates to be treated only, and not the surfaces of the racks. The method involves the following steps: a. pickling the surfaces with a solution containing chromate ions; b. activating the pickled surfaces with a silver colloid containing stannous ions; c. treating the activated surfaces with an accelerating solution in order to remove tin compounds from the surfaces; and d. depositing, by means of an electroless nickel plating bath, a layer that substantially consists of nickel to the surfaces treated with the accelerating solution, the electroless nickel plating bath containing at least one reducing agent selected from the group comprising borane compounds.
公开/授权文献
- EP1343921B1 METHOD FOR ELECTROLESS NICKEL PLATING 公开/授权日:2005-03-16
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