发明公开
- 专利标题： HIGH REFRACTIVE INDEX MICROREPLICATION RESIN
- 专利标题（中）： MIKROREPLICATIONSHARZ高折射率
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申请号： EP01932822.8申请日： 2001-05-01
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公开(公告)号： EP1352000A1公开(公告)日： 2003-10-15
- 发明人: OLSON, David, B. , POKORNY, Richard, J. , FONG, Bettie, C.
- 申请人： 3M Innovative Properties Company
- 申请人地址： 3M Center,P.O. Box 33427 Saint Paul, MN 55133-3427 US
- 专利权人： 3M Innovative Properties Company
- 当前专利权人： 3M Innovative Properties Company
- 当前专利权人地址： 3M Center,P.O. Box 33427 Saint Paul, MN 55133-3427 US
- 代理机构： VOSSIUS & PARTNER
- 优先权： US746613 20001221
- 国际公布： WO02051892 20020704
- 主分类号： C08F228/02
- IPC分类号： C08F228/02 ; C08F220/30 ; G02B1/04
摘要：
A polymerizable composition that includes a monomer of the formula (I) wherein X is hydrogen or one or more of methyl, chlorine, bromine or iodine, R1 is a straight or branched alkyl linking group of 2 to 12 carbon atoms, R2 is hydrogen or methyl, and n is 1 to 3; and a monomer of the formula (II) wherein X¿1? and X2 are each independently hydrogen or one or more of methyl, chlorine, bromine or iodine, and R?2¿ is hydrogen or methyl is described having a high index of refraction and being suitable for use in forming an optical product.
公开/授权文献
- EP1352000B1 HIGH REFRACTIVE INDEX MICROREPLICATION RESIN 公开/授权日：2005-12-21
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