发明公开
EP1359602A3 Detection apparatus, detection method and electron beam irradiation apparatus
有权
检测装置,用于与电子辐照检测方法和装置
- 专利标题: Detection apparatus, detection method and electron beam irradiation apparatus
- 专利标题(中): 检测装置,用于与电子辐照检测方法和装置
-
申请号: EP03290943.4申请日: 2003-04-16
-
公开(公告)号: EP1359602A3公开(公告)日: 2005-09-07
- 发明人: Miura, Yoshihisa, c/o Sony Corporation , Aki, Yuichi, c/o Sony Corporation
- 申请人: SONY CORPORATION
- 申请人地址: 7-35, Kitashinagawa 6-chome Shinagawa-ku Tokyo JP
- 专利权人: SONY CORPORATION
- 当前专利权人: SONY CORPORATION
- 当前专利权人地址: 7-35, Kitashinagawa 6-chome Shinagawa-ku Tokyo JP
- 代理机构: Thévenet, Jean-Bruno
- 优先权: JP2002122966 20020424
- 主分类号: H01J37/301
- IPC分类号: H01J37/301 ; H01J37/305 ; G11B7/26
摘要:
A detection apparatus, a detection method and an electron beam irradiation apparatus for detecting deflection electrons in order to precisely focus even if a vacuum seal valve is provided. An electron beam irradiation apparatus including a vacuum seal valve mechanism which is provided in a static pressure floating pad, and opens/closes an electron beam passage with a piston so as to switch between an electron beam irradiation state and a vacuum seal state, and a deflection electron detector which is provided between the vacuum seal valve mechanism and a master disk and detects a deflection electron signal generated from the master disk with electron beam irradiation.
公开/授权文献
信息查询