发明公开
EP1366508A2 APPARATUS AND METHOD FOR ATMOSPHERIC PRESSURE REACTIVE ATOM PLASMA PROCESSING FOR SURFACE MODIFICATION
有权
方法和系统与大气压力表面改性无功ATOM等离子体处理
- 专利标题: APPARATUS AND METHOD FOR ATMOSPHERIC PRESSURE REACTIVE ATOM PLASMA PROCESSING FOR SURFACE MODIFICATION
- 专利标题(中): 方法和系统与大气压力表面改性无功ATOM等离子体处理
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申请号: EP02706029.2申请日: 2002-01-29
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公开(公告)号: EP1366508A2公开(公告)日: 2003-12-03
- 发明人: CARR, Jeffrey, W.
- 申请人: Rapt Industries Inc.
- 申请人地址: 6252 Preston Avenue Livermore, CA 94550 US
- 专利权人: Rapt Industries Inc.
- 当前专利权人: Rapt Industries Inc.
- 当前专利权人地址: 6252 Preston Avenue Livermore, CA 94550 US
- 代理机构: Calderbank, Thomas Roger
- 优先权: US265332P 20010130; US2483 20011101
- 国际公布: WO02062111 20020808
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Reactive atom plasma processing can be used to shape, polish, planarize and clean the surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other. whether by translating and/or rotating the workpiece, the plasma, or both. The plasma discharge from the torch can be used to shape, planarize, polish, and/or clean the surface of the workpiece, as well as to thin the workpiece. The processing may cause minimal or no damage to the workpiece underneath the surface, and may involve removing material from the surface of the workpiece.
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