发明公开
- 专利标题: Solid-state imaging device and method of manufacturing the same
- 专利标题(中): 固态成像装置及其制造方法
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申请号: EP03253964.5申请日: 2003-06-24
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公开(公告)号: EP1376705A3公开(公告)日: 2007-01-17
- 发明人: Maeda, Hiroshi , Nishida, Kazuhiro , Negishi, Yoshihisa , Hosaka, Shunichi
- 申请人: FUJI PHOTO FILM CO., LTD.
- 申请人地址: No. 210 Nakanuma Minami-Ashigara-shi, Kanagawa JP
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人地址: No. 210 Nakanuma Minami-Ashigara-shi, Kanagawa JP
- 代理机构: Stevens, Jason Paul
- 优先权: JP2002183073 20020624; JP2003175163 20030619
- 主分类号: H01L31/0203
- IPC分类号: H01L31/0203 ; H01L31/02
摘要:
There are provided a semiconductor substrate 101 on which solid-state imaging devices are formed, and a translucent member 201 provided onto a surface of the semiconductor substrate such that spaces are provided to oppose to light receiving areas of the solid-state imaging devices, wherein external connecting terminals are arranged on an opposing surface of the semiconductor substrate 101 to a solid-state imaging device forming surface, and the external connecting terminals are connected to the solid-state imaging devices via through-holes provided in the semiconductor substrate 101.
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