发明公开
EP1380887A1 X-radiation sensitive aqueous-based photothermographic materials and methods of using same 审中-公开
X射线辐射敏感水溶液的光热敏成像材料和它们的使用方法

  • 专利标题: X-radiation sensitive aqueous-based photothermographic materials and methods of using same
  • 专利标题(中): X射线辐射敏感水溶液的光热敏成像材料和它们的使用方法
  • 申请号: EP03076954.1
    申请日: 2003-06-23
  • 公开(公告)号: EP1380887A1
    公开(公告)日: 2004-01-14
  • 发明人: Simpson, Sharon M.Moore, William E.
  • 申请人: EASTMAN KODAK COMPANY
  • 申请人地址: 343 State Street Rochester, New York 14650 US
  • 专利权人: EASTMAN KODAK COMPANY
  • 当前专利权人: EASTMAN KODAK COMPANY
  • 当前专利权人地址: 343 State Street Rochester, New York 14650 US
  • 代理机构: Haile, Helen Cynthia
  • 优先权: US193395 20020711
  • 主分类号: G03C1/498
  • IPC分类号: G03C1/498
X-radiation sensitive aqueous-based photothermographic materials and methods of using same
摘要:
Aqueous-based photothermographic materials that are sensitive to visible or X-radiation contain X-radiation sensitive phosphors in association with specific chemically sensitized tabular silver halide grains. The silver halide grains comprise at least 70 mol % bromide ,based on total silver halide, have an average thickness of at least 0.02 µm and up to and including 0.10 µm, an equivalent circular diameter (ECD) of at least 0.5 µm and up to and including 8 µm, and an aspect ratio of at least 5:1. These materials can be imaged in any suitable fashion but preferably they have one or more photothermographic layers on both sides of the support and can be imaged using X-radiation with or without an associated phosphor intensifying screen.
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