发明公开
- 专利标题： PROJEKTIONSBELICHTUNGSANLAGE DER MIKROLITHOGRAPHIE
- 专利标题（英）： Microlithograpic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method
- 专利标题（中）： 微光刻投影曝光系统
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申请号： EP02769464.5申请日： 2002-05-04
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公开(公告)号： EP1390813A2公开(公告)日： 2004-02-25
- 发明人: BRUNOTTE, Martin , HARTMAIER, Jürgen , HOLDERER, Hubert , KAISER, Winfried , KOHL, Alexander , KUGLER, Jens , MAUL, Manfred , WAGNER, Christian
- 申请人： Carl Zeiss SMT AG , CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- 申请人地址： Carl Zeiss-Strasse 22 73447 Oberkochen DE
- 专利权人： Carl Zeiss SMT AG,CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- 当前专利权人： Carl Zeiss SMT AG,CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- 当前专利权人地址： Carl Zeiss-Strasse 22 73447 Oberkochen DE
- 代理机构： Ostertag, Ulrich, Dr.
- 优先权： DE10123725 20010515
- 国际公布： WO2002093257 20021121
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G02B5/30
摘要：
The injection relates to a projection illumination system, especially one with 157 or 193 nm and an image-side NA of 0.8 0.95, comprising fluoride crystal lenses (43, 43), wherein the negative effect of the angle-dependent birefringence thereof is reduced by relative rotation around the optical axis (O) and/or by a correction element (44) close to a plane of the pupil (P).
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