发明公开
EP1427262A4 PATTERNING METHOD, FILM FORMING METHOD, PATTERNING DEVICE, FILM FORMING DEVICE, ELECTRO-OPTIC DEVICE AND PRODUCTION METHOD THEREFOR, ELECTRONIC APPARATUS, AND ELECTRONIC DEVICE AND PRODUCTION METHOD THEREFOR
审中-公开
构筑方法，FILM训练方法，结构装置，电影培训机构; 电光装置和方法，其用于生产电子器件和电子设备及工艺
- 专利标题： PATTERNING METHOD, FILM FORMING METHOD, PATTERNING DEVICE, FILM FORMING DEVICE, ELECTRO-OPTIC DEVICE AND PRODUCTION METHOD THEREFOR, ELECTRONIC APPARATUS, AND ELECTRONIC DEVICE AND PRODUCTION METHOD THEREFOR
- 专利标题（中）： 构筑方法，FILM训练方法，结构装置，电影培训机构; 电光装置和方法，其用于生产电子器件和电子设备及工艺
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申请号： EP02765527申请日： 2002-09-12
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公开(公告)号： EP1427262A4公开(公告)日： 2006-08-23
- 发明人: MIYAZAWA TAKASHI
- 申请人： SEIKO EPSON CORP
- 专利权人： SEIKO EPSON CORP
- 当前专利权人： SEIKO EPSON CORP
- 优先权： JP2001277102 2001-09-12
- 主分类号： H05B33/10
- IPC分类号： H05B33/10 ; B05C5/00 ; B05C9/08 ; B05C15/00 ; C23C14/04 ; H01L27/32 ; H01L51/00 ; H01L51/30 ; H01L51/40 ; H01L51/50 ; H05B33/14 ; B41J2/01
摘要：
A novel patterning method improved in degree of freedom in material selection, a film forming method, a patterning device, a film forming device, an electro-optic device and a production method therefor, an electronic apparatus, an electronic device and a production method therefor. A patterning device (1) comprising a vacuum chamber (2) controllable to a high degree of vacuum, a nozzle (3) connected to a material supply source (7) and mounted to the vacuum chamber (2), for supplying materials from the material supply source (7) into the vacuum chamber (2), and a substrate stage (4) provided in the chamber (2), for holding and fixing a substrate (S), a moving mechanism (11) being provided to the nozzle (3) or the substrate stage (4) to relatively move their positions. Ideally, it is preferable to generate a free jet of material molecules to effect patterning (free jet patterning) using this free jet. Accordingly, a high-accuracy patterning is made available.
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