发明公开
- 专利标题: VORRICHTUNG ZUR MESSUNG UND/ODER ÜBERWACHUNG EINER PHYSIKALISCHEN ODER CHEMISCHEN PROZESSGRÖSSE
- 专利标题(英): Device for measuring and/or monitoring a physical or chemical process variable
- 专利标题(中): 用于测量和/或监测物理或化学加工尺寸
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申请号: EP02790344.2申请日: 2002-11-08
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公开(公告)号: EP1446639A1公开(公告)日: 2004-08-18
- 发明人: SPANKE, Dietmar , VON STEIN, Bert , KILIAN, Markus , ALBERS, Stefan
- 申请人: Endress + Hauser GmbH + Co. KG.
- 申请人地址: Hauptstrasse 1 79689 Maulburg DE
- 专利权人: Endress + Hauser GmbH + Co. KG.
- 当前专利权人: Endress + Hauser GmbH + Co. KG.
- 当前专利权人地址: Hauptstrasse 1 79689 Maulburg DE
- 代理机构: Andres, Angelika
- 优先权: DE10156907 20011121
- 国际公布: WO2003044467 20030530
- 主分类号: G01D3/02
- IPC分类号: G01D3/02 ; G01D18/00
摘要:
The invention relates to a device for measuring and/or monitoring a physical or chemical process variable, comprising a measuring and/or monitoring appliance (2), at least one memory unit (3) and one display, input and/or output unit (4; 5). The at least one memory unit (3) is embodied as a non-volatile, writable memory. Information (13) relating to the firm, device and/or process is or can be stored in the at least one memory unit (3). Desired information (13) can be called by the display unit (4) or by the input/output unit (5) and/or can be automatically displayed according to a defined state of the measuring and/or monitoring appliance (2). Said information (13) is represented on the at least one program side (12) or is output when the at least one program side (12) is called.
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