发明公开
EP1451861A1 APPARATUS AND METHOD FOR REACTIVE ATOM PLASMA PROCESSING FOR MATERIAL DEPOSITION
审中-公开
DEVICE AND METHOD FOR反应等离子处理对核材料矿床
- 专利标题： APPARATUS AND METHOD FOR REACTIVE ATOM PLASMA PROCESSING FOR MATERIAL DEPOSITION
- 专利标题（中）： DEVICE AND METHOD FOR反应等离子处理对核材料矿床
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申请号： EP02706064.9申请日： 2002-01-30
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公开(公告)号： EP1451861A1公开(公告)日： 2004-09-01
- 发明人: CARR, Jeffrey, W.
- 申请人： Rapt Industries Inc.
- 申请人地址： 1581 Melanie Way Livemore, CA 94550 US
- 专利权人： Rapt Industries Inc.
- 当前专利权人： Rapt Industries Inc.
- 当前专利权人地址： 1581 Melanie Way Livemore, CA 94550 US
- 代理机构： Calderbank, Thomas Roger
- 优先权： US8236 20011107
- 国际公布： WO2003041146 20030515
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
An apparatus a(106)nd a method for reactive atom plasma processing to shape, polish, planarize, and clean surfaces of materials with minimal subsurface damage. A workpiece (110) and a plasma torch (502) are moved with respect to each other. A plasma discharge from the torch (502) can be used to shape, planarize, polish, clean and deposit material on the surface of the workpiece (110).
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