发明公开
- 专利标题: Exposure device and exposure method
- 专利标题(中): Belichtungsvorrichtung und Belichtungsverfahren
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申请号: EP04013528.7申请日: 2004-06-08
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公开(公告)号: EP1486905A1公开(公告)日: 2004-12-15
- 发明人: Ehara, Takuji Noritsu Koki Co, Ltd , Nakahara, Fumihiro Noritsu Koki Co, Ltd
- 申请人: Noritsu Koki Co., Ltd.
- 申请人地址: 579-1 Umehara Wakayama-shi, Wakayama-ken 640-8550 JP
- 专利权人: Noritsu Koki Co., Ltd.
- 当前专利权人: Noritsu Koki Co., Ltd.
- 当前专利权人地址: 579-1 Umehara Wakayama-shi, Wakayama-ken 640-8550 JP
- 代理机构: Müller-Boré & Partner Patentanwälte
- 优先权: JP2003164116 20030609
- 主分类号: G06K15/02
- IPC分类号: G06K15/02
摘要:
In an exposure device according to the present invention, a plurality of exposure bands each containing multiple dots is formed on photographic paper by repeating main scanning in a main scanning direction based on image data that contains multiple pixels and the transfer of the photographic paper in a sub scanning direction. Of the multiple dots contained in each of two continuous exposure bands, the mean value of the pixel levels of two pixels corresponding to two dots with the same positional relationship for the main scanning direction is calculated to derive interpolation data. Thus, the region between the two dots neighboring in the sub scanning direction on the photographic paper is exposed on the basis of the interpolation data.
公开/授权文献
- EP1486905B1 Exposure device and exposure method 公开/授权日:2009-04-08
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