发明公开
- 专利标题: PLASMA-ASSISTED FORMATION OF CARBON STRUCTURES
- 专利标题(中): 碳结构等离子体辅助的形成
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申请号: EP03728706.7申请日: 2003-05-07
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公开(公告)号: EP1501631A1公开(公告)日: 2005-02-02
- 发明人: KUMAR, Satyendra , KUMAR, Devendra
- 申请人: DANA CORPORATION
- 申请人地址: 4500 Dorr Street Toledo, OH 43615 US
- 专利权人: DANA CORPORATION
- 当前专利权人: DANA CORPORATION
- 当前专利权人地址: 4500 Dorr Street Toledo, OH 43615 US
- 代理机构: Price, Nigel John King
- 优先权: US378693P 20020508; US430677P 20021204; US435278P 20021223
- 国际公布: WO2003095089 20031120
- 主分类号: B01J19/08
- IPC分类号: B01J19/08
摘要:
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
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