发明公开
EP1514909A3 Nanoparticle with excellent durability, and method of manufacturing the same
有权
具有改进的耐久性和制造它们的方法纳米级颗粒
- 专利标题： Nanoparticle with excellent durability, and method of manufacturing the same
- 专利标题（中）： 具有改进的耐久性和制造它们的方法纳米级颗粒
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申请号： EP04020667.4申请日： 2004-08-31
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公开(公告)号： EP1514909A3公开(公告)日： 2006-07-05
- 发明人: Sato, Keiichi , Kuwabata, Susumu, Osaka University
- 申请人： HITACHI SOFTWARE ENGINEERING CO., LTD.
- 申请人地址： 1-43, Suehiro-cho 1-chome Tsurumi-ku Yokohama-shi, Kanagawa 230-0045 JP
- 专利权人： HITACHI SOFTWARE ENGINEERING CO., LTD.
- 当前专利权人： HITACHI SOFTWARE ENGINEERING CO., LTD.
- 当前专利权人地址： 1-43, Suehiro-cho 1-chome Tsurumi-ku Yokohama-shi, Kanagawa 230-0045 JP
- 代理机构： Liesegang, Roland
- 优先权： JP2003316552 20030909; JP2003413856 20031211
- 主分类号： C09K11/56
- IPC分类号： C09K11/56 ; C01G11/00 ; C09C1/00
摘要：
The resistance of a semiconductor nanoparticle provided with a surface treatment, such as an OH coating or ammonia treatment, against external factors is improved. A semiconductor nanoparticle provided with a surface treatment such as an OH coating or ammonia treatment and having high-emission properties is coated with an organic material, such as hexylamine, dodecylamine, trioctylmethylammonium, tridodecilmethylammonium, and similar organic material, by migrating the semiconductor nanoparticle from an aqueous phase to an organic solvent, such as hexane or toluene, thereby providing it with durability against external factors.
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