发明授权
- 专利标题: MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY UNIT
- 专利标题(中): 元磁阻效应和磁存储单元
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申请号: EP03766709.4申请日: 2003-08-01
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公开(公告)号: EP1526588B1公开(公告)日: 2012-01-04
- 发明人: OBA, Kazuhiro , KANO, Hiroshi , HOSOMI, Masanori , BESSHO, Kazuhiro , YAMAMOTO, Tetsuya , MIZUGUCHI, Tetsuya
- 申请人: Sony Corporation
- 申请人地址: 1-7-1, Konan Minato-ku Tokyo JP
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: 1-7-1, Konan Minato-ku Tokyo JP
- 代理机构: Müller - Hoffmann & Partner
- 优先权: JP2002226520 20020802
- 国际公布: WO2004013919 20040212
- 主分类号: H01L43/08
- IPC分类号: H01L43/08 ; H01L27/22
摘要:
A magnetoresistance effect element having good magnetic characteristics by preventing a deterioration, by heat treating, in a reluctance change rate, and a magnetic memory unit provided with this magnetoresistance effect element to provide excellent writing characteristics. A magnetoresistance effect element (1) comprising a pair of ferromagnetic layers (magnetization fixed layer (5) and magnetization free layer (7)) facing each other via an intermediate layer (6) to allow a reluctance to be changed by running a current perpendicularly to a film surface, at least one of the pair of ferromagnetic layers (5, 7) containing an amorphous ferromagnetic material having a crystallizing temperature of at least 623 K; and a magnetic memory unit comprising this magnetoresistance effect element (1) and bit lines and word lines sandwiching the magnetoresistance effect element (1) in a thickness direction.
公开/授权文献
- EP1526588A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY UNIT 公开/授权日:2005-04-27
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