发明公开
EP1559812A1 METHOD OF MEASURING POINT DEFECT DISTRIBUTION OF SILICON SINGLE CRYSTAL INGOT
有权
VERFAHREN ZUR BESTIMMUNG DERPUNKTDEFEKTVERTEILUNG EINES SILICIUMEINKRISTALLSTABS
- 专利标题: METHOD OF MEASURING POINT DEFECT DISTRIBUTION OF SILICON SINGLE CRYSTAL INGOT
- 专利标题(中): VERFAHREN ZUR BESTIMMUNG DERPUNKTDEFEKTVERTEILUNG EINES SILICIUMEINKRISTALLSTABS
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申请号: EP03756681.7申请日: 2003-10-17
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公开(公告)号: EP1559812A1公开(公告)日: 2005-08-03
- 发明人: KURITA, Kazunari c/o SUMITOMO MITSUBISHI , FURUKAWA, Jun c/o SUMITOMO MITSUBISHI
- 申请人: Sumitomo Mitsubishi Silicon Corporation
- 申请人地址: 2-1, Shibaura 1-chome, Minato-ku Tokyo 105-8634 JP
- 专利权人: Sumitomo Mitsubishi Silicon Corporation
- 当前专利权人: Sumitomo Mitsubishi Silicon Corporation
- 当前专利权人地址: 2-1, Shibaura 1-chome, Minato-ku Tokyo 105-8634 JP
- 代理机构: Bublak, Wolfgang
- 优先权: JP2002304410 20021018
- 国际公布: WO2004035879 20040429
- 主分类号: C30B29/06
- IPC分类号: C30B29/06 ; G01N27/04
摘要:
A single crystal ingot is cut to an axial direction so as to including the central axis, a sample for measurement including regions [V], [Pv], [Pi] and [I] is prepared, and a first sample and second sample are prepared by dividing the sample into two so as to be symmetrical against the central axis. A first transition metal is metal-stained on the surface of the first sample and a second transition metal different from the first transition metal is metal-stained on the surface of the second sample. The first and second samples stained with the metals are thermally treated and the first and second transition metals are diffused into the inside of the samples. Recombination lifetimes in the whole of the first and second samples are respectively measured, and the vertical measurement of the first sample is overlapped on the vertical measurement of the second sample. The boundary between the regions [Pi] and [I] and the boundary between the regions [V] and [Pv] are respectively specified from the overlapped result.
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