发明公开
EP1566416A4 COATING LIQUID FOR FORMING AMORPHOUS SILICA COATING FILM OF LOW DIELECTRIC CONSTANT AND PROCESS FOR PRODUCING THE COATING LIQUID 有权
涂布液产生用于涂敷液的涂敷无定形氧化硅低介电AND METHOD

COATING LIQUID FOR FORMING AMORPHOUS SILICA COATING FILM OF LOW DIELECTRIC CONSTANT AND PROCESS FOR PRODUCING THE COATING LIQUID
摘要:
The present invention relates to a coating liquid for forming an amorphous silica-based coating film with a low dielectric constant of 2.5 or below and the Young' s modulus of 6.0 GPa or more and having excellent hydrophobic property, and to a method of preparing the same. The coating liquid may contain a silicon compound obtained by hydrolyzing tetraalkyl ortho silicate (TAOS) and specific alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH), or may contain a silicon compound obtained by hydrolyzing or partially hydrolyzing tetraalkyl ortho silicate (TAOS) in the presence of tetraalkyl ammonium hydroxide (TAAOH), mixing the reaction product with specific alkoxysilane or a hydrolysate or a partial hydrolysate thereof, and hydrolyzing all or a portion of the mixture according to the necessity. In addition, the coating liquid is prepared by mixing components described above at a specific ratio and under specific process conditions.
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