发明公开
EP1566416A4 COATING LIQUID FOR FORMING AMORPHOUS SILICA COATING FILM OF LOW DIELECTRIC CONSTANT AND PROCESS FOR PRODUCING THE COATING LIQUID
有权
涂布液产生用于涂敷液的涂敷无定形氧化硅低介电AND METHOD
- 专利标题: COATING LIQUID FOR FORMING AMORPHOUS SILICA COATING FILM OF LOW DIELECTRIC CONSTANT AND PROCESS FOR PRODUCING THE COATING LIQUID
- 专利标题(中): 涂布液产生用于涂敷液的涂敷无定形氧化硅低介电AND METHOD
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申请号: EP03758925申请日: 2003-10-27
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公开(公告)号: EP1566416A4公开(公告)日: 2007-02-28
- 发明人: NAKASHIMA AKIRA , EGAMI MIKI , KOMATSU MICHIO , NAKATA YOSHIHIRO , YANO EI , SUZUKI KATSUMI
- 申请人: CATALYSTS & CHEM IND CO , FUJITSU LTD
- 专利权人: CATALYSTS & CHEM IND CO,FUJITSU LTD
- 当前专利权人: CATALYSTS & CHEM IND CO,FUJITSU LTD
- 优先权: JP2002318417 2002-10-31
- 主分类号: C01B33/12
- IPC分类号: C01B33/12 ; C09D183/04 ; C08G77/08 ; C09D5/25 ; C09D183/02 ; H01L21/312 ; H01L21/316
摘要:
The present invention relates to a coating liquid for forming an amorphous silica-based coating film with a low dielectric constant of 2.5 or below and the Young' s modulus of 6.0 GPa or more and having excellent hydrophobic property, and to a method of preparing the same. The coating liquid may contain a silicon compound obtained by hydrolyzing tetraalkyl ortho silicate (TAOS) and specific alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH), or may contain a silicon compound obtained by hydrolyzing or partially hydrolyzing tetraalkyl ortho silicate (TAOS) in the presence of tetraalkyl ammonium hydroxide (TAAOH), mixing the reaction product with specific alkoxysilane or a hydrolysate or a partial hydrolysate thereof, and hydrolyzing all or a portion of the mixture according to the necessity. In addition, the coating liquid is prepared by mixing components described above at a specific ratio and under specific process conditions.
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