发明公开
EP1602131A1 VIA AND TRENCH STRUCTURES FOR SEMICONDUCTOR SUBSTRATES BONDED TO METALLIC SUBSTRATES
审中-公开
通过抢结构金属基体上结合半导体衬底
- 专利标题: VIA AND TRENCH STRUCTURES FOR SEMICONDUCTOR SUBSTRATES BONDED TO METALLIC SUBSTRATES
- 专利标题(中): 通过抢结构金属基体上结合半导体衬底
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申请号: EP04720556.2申请日: 2004-03-15
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公开(公告)号: EP1602131A1公开(公告)日: 2005-12-07
- 发明人: CUNNINGHAM, Shaun, Joseph
- 申请人: COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION
- 申请人地址: Limestone Avenue Campbell,ACT 2612 AU
- 专利权人: COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION
- 当前专利权人: COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION
- 当前专利权人地址: Limestone Avenue Campbell,ACT 2612 AU
- 代理机构: Kazi, Ilya
- 优先权: US389278 20030313; US634512 20030804
- 国际公布: WO2004082020 20040923
- 主分类号: H01L23/52
- IPC分类号: H01L23/52 ; H01L23/36 ; H01L23/66 ; H01L21/76
摘要:
A compound semiconductor substrate, such as a GaAs substrate, is eutectically bonded to a metallic substrate (400). The semiconductor substrate is optionally thinned, and vias or trenches (601) are formed from the front side for making easily aligned interconnects to the metal substrate (400). The mechanical support given by the metallic substrate (400) permits the vias or trenches (601) to be any shape. Trenches (601) can surround a particular circuit element, to provide thermal isolation or heat spreading, or (in combination with metallic air bridges) to provide electromagnetic screening. Trench structures (601) also provide lower impedance ground connections at very high frequencies, in comparison to standard via holes. The metallic substrate (600) can be used as a ground plane or as a heat sink.
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