发明公开
- 专利标题: VORRICHTUNG ZUM TRANSPORTIEREN EINES FLACHEN SUBSTRATS IN EINER VAKUUMKAMMER
- 专利标题(英): Device for transporting a flat substrate in a vacuum chamber
- 专利标题(中): 设备用于传输平面基板在真空室
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申请号: EP04718265.4申请日: 2004-03-08
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公开(公告)号: EP1618056A1公开(公告)日: 2006-01-25
- 发明人: BANGERT, Stefan , FUCHS, Frank , SCHÜSSLER, Uwe , LINDENBERG, Ralph , STOLLEY, Tobias
- 申请人: Applied Films GmbH & Co. KG
- 申请人地址: Siemensstrasse 100 63755 Alzenau DE
- 专利权人: Applied Films GmbH & Co. KG
- 当前专利权人: Applied Films GmbH & Co. KG
- 当前专利权人地址: Siemensstrasse 100 63755 Alzenau DE
- 代理机构: Schickedanz, Willi
- 优先权: DE10319379 20030430
- 国际公布: WO2004096678 20041111
- 主分类号: B65G49/06
- IPC分类号: B65G49/06
摘要:
The invention relates to a device for transporting a flat substrate through a coating plant consisting, for example of a plurality of different sputtering cathodes to which flat substrates, for example glass plates, are successively transported in vacuum. The aim of said invention is to avoid abrasion between said glass plates and a support. For this purpose, a glass plate is distanced from the support by a compressed gas coming through relatively few-numbered and small-sized orifices arranged in a gas channel. As far as small sizes of said orifices prevent any rapid pressure compensation between the gas channel and the rest of said coating plant when it is at atmospheric pressure on in vacuum, said gas channel is separated from the rest of the plant and provided with an individual gas pipe which makes it possible to introduce into the gas channel or pumped out therefrom.
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