发明公开
- 专利标题: GLOW DISCHARGE-GENERATED CHEMICAL VAPOR DEPOSITION
- 专利标题(中): 辉光放电产生的化学气相沉积
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申请号: EP04816852.0申请日: 2004-09-07
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公开(公告)号: EP1663518A2公开(公告)日: 2006-06-07
- 发明人: GABELNICK, Aaron, M. , LAMBERT, Christina
- 申请人: DOW GLOBAL TECHNOLOGIES INC.
- 申请人地址: Washington Street, 1790 Building Midland, Michigan 48674 US
- 专利权人: DOW GLOBAL TECHNOLOGIES INC.
- 当前专利权人: DOW GLOBAL TECHNOLOGIES INC.
- 当前专利权人地址: Washington Street, 1790 Building Midland, Michigan 48674 US
- 代理机构: Raynor, John
- 优先权: US501477P 20030909
- 国际公布: WO2005049228 20050602
- 主分类号: B05D7/24
- IPC分类号: B05D7/24 ; C23C16/505 ; C23C16/40
摘要:
A process for creating plasma polymerized deposition on a substrate using a glow discharge is described. The glow discharge is created between an electrode (16) and a counterelectrode (24). A mixture of a balance gas and a tetraalkylorthosilicate is flowed through the glow discharge onto a substrate (28) to deposit a coating onto the substrate as an optically clear coating or to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free coating.
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