发明公开
- 专利标题： NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS
- 专利标题（中）： 新型光敏树脂组合
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申请号： EP04795072.0申请日： 2004-10-15
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公开(公告)号： EP1680711A2公开(公告)日： 2006-07-19
- 发明人: NAIINI, Ahmad, A. , HOPLA, Richard , POWELL, David, B. , METIVIER, Jon , RUSHKIN, Il'ya
- 申请人： Fujifilm Electronic Materials USA, Inc.
- 申请人地址： 501 Merritt 7, P.O.Box 5204 Norwalk, CT 06856-5204 US
- 专利权人： Fujifilm Electronic Materials USA, Inc.
- 当前专利权人： Fujifilm Electronic Materials USA, Inc.
- 当前专利权人地址： 501 Merritt 7, P.O.Box 5204 Norwalk, CT 06856-5204 US
- 代理机构： Bannerman, David Gardner
- 优先权： US511198P 20031015
- 国际公布： WO2005038524 20050428
- 主分类号： G03F1/00
- IPC分类号： G03F1/00
摘要：
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
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