发明公开
- 专利标题： TRÄGERPLATTE FÜR SPUTTERTARGETS
- 专利标题（英）： Support plate for sputter targets
- 专利标题（中）： 支撑板用于溅射靶材
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申请号： EP05731108.6申请日： 2005-04-09
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公开(公告)号： EP1743047A1公开(公告)日： 2007-01-17
- 发明人: SCHOLL, Roland , MEYER, Bernd , PASSING, Gerd , WÖTTING, Gerhard
- 申请人： H.C. Starck GmbH & Co. KG
- 申请人地址： Im Schleeke 78-91 38642 Goslar DE
- 专利权人： H.C. Starck GmbH & Co. KG
- 当前专利权人： H.C. Starck GmbH & Co. KG
- 当前专利权人地址： Im Schleeke 78-91 38642 Goslar DE
- 代理机构： Feldhues, Michael L.F.
- 优先权： DE102004020404 20040423
- 国际公布： WO2005106068 20051110
- 主分类号： C23C14/34
- IPC分类号： C23C14/34
摘要：
Disclosed is a support plate for sputter targets. Said support plate is made of a composite material containing 5 to 99 percent by weight of at least one refractory metal from the group comprising Mo, W, Re, and Ta as well as 95 to 1 percent by weight of at least one additional metallic component from the group comprising Cu, Ag, and Au. Also disclosed are a method for producing said support plate and a unit encompassing the inventive support plate and a sputter target.
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