Invention Publication
- Patent Title: Interference measurement apparatus
- Patent Title (中): 干涉测量仪
-
Application No.: EP06253843.4Application Date: 2006-07-21
-
Publication No.: EP1748277A1Publication Date: 2007-01-31
- Inventor: Kadowaki, Hidejiro , Ishizuka, Ko , Kato, Shigeki
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: 3-30-2 Shimomaruko Ohta-ku, Tokyo JP
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: 3-30-2 Shimomaruko Ohta-ku, Tokyo JP
- Agency: Legg, Cyrus James Grahame
- Priority: JP2005218980 20050728
- Main IPC: G01B9/02
- IPC: G01B9/02
Abstract:
A first beam having high coherence and a second beam having low coherence are multiplexed onto the same optical axis. This multiplexed beam is split into first and second multiplexed beams. The first multiplexed beam is directed towards a measurement reflection plane of an object to be measured, and the second multiplexed beam is directed towards a reference plane. The first and second multiplexed beams that are reflected from the measurement reflection plane and the reference plane, respectively, are multiplexed to cause the first beams to interfere with each other and the second beams to interfere with each other. Calculations are carried out to determine a measurement origin on the basis of the first and second interference signals obtained from the first and second beams, respectively.
Public/Granted literature
- EP1748277B1 Interference measurement apparatus Public/Granted day:2008-12-31
Information query