The design of a probe and an instrument on its basis suggested in the present invention solve near-field optical microscopy and near-field infrared microscopy problems. Also the new method of probe manufacture suggested in this invention allows one to considerably reduce the cost of the final product and, thus, considerably increase the number of its possible users. The probe design suggested in this invention and the instrument based on these probes allow one to optically record and read the information and also to perform lithography works, in particular, the works with exposure of a photoresist at a nanometer resolution.