Invention Publication
- Patent Title: Pressure-contact semiconductor device
- Patent Title (中): 压力接触半导体器件
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Application No.: EP07004143.9Application Date: 2007-02-28
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Publication No.: EP1906443A2Publication Date: 2008-04-02
- Inventor: Taguchi, Kazunori , Oota, Kenji
- Applicant: MITSUBISHI ELECTRIC CORPORATION
- Applicant Address: 7-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8310 JP
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: 7-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8310 JP
- Agency: Klein, Peter
- Priority: JP2006260422 20060926
- Main IPC: H01L23/051
- IPC: H01L23/051 ; H01L23/04
Abstract:
A pressure-contact semiconductor device (100) includes thermal buffer plates (2) and main electrode blocks (3) having flanges (4), by which semiconductor substrate (1) having a pair of electrodes is sandwiched, disposed opposed to each side thereof, wherein the semiconductor substrate (1) is sealed in a gastight space by joining the flanges (4) to insulating container (5). The semiconductor device (100) is configured such that the outermost periphery of the semiconductor substrate (1) is enclosed by hollow cylindrical insulator (9) fitted on outer peripheries of the main electrode blocks (3) in the gastight space with O-rings (8) fitted between the main electrode blocks (3) and the cylindrical insulator (9), and sealed with reaction force from the O-rings (8).
Public/Granted literature
- EP1906443B1 Pressure-contact semiconductor device Public/Granted day:2013-09-18
Information query
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