发明公开
EP1912253A2 Method of forming a dielectric film
审中-公开
Verfahren zur Herstellung einer dielektrischen Folie
- 专利标题: Method of forming a dielectric film
- 专利标题(中): Verfahren zur Herstellung einer dielektrischen Folie
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申请号: EP08001543.1申请日: 2001-03-13
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公开(公告)号: EP1912253A2公开(公告)日: 2008-04-16
- 发明人: Ohmi, Tadahiro , Sugawa, Shigetoshi
- 申请人: Ohmi, Tadahiro
- 申请人地址: 1-17-301, Komegafukuro 2-chome, Aoba-ku Sendai-shi, Miyagi 980-0813 JP
- 专利权人: Ohmi, Tadahiro
- 当前专利权人: Ohmi, Tadahiro
- 当前专利权人地址: 1-17-301, Komegafukuro 2-chome, Aoba-ku Sendai-shi, Miyagi 980-0813 JP
- 代理机构: Liesegang, Eva
- 优先权: JP2000115940 20000313
- 主分类号: H01L21/316
- IPC分类号: H01L21/316 ; H01L21/318 ; H01L21/3105
摘要:
A method of forming an insulation film includes the steps of forming an insulation film on a substrate, and modifying a film quality of the insulation film by exposing the insulation film to atomic state oxygen O* or atomic state hydrogen nitride radicals NH* formed with plasma that uses Kr or Ar as inert gas.
公开/授权文献
- EP1912253A3 Method of forming a dielectric film 公开/授权日:2009-12-30
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