发明授权
- 专利标题: GaN based HEMTs with buried field plates
- 专利标题(中): GaN基HEMT的具有掩埋场板
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申请号: EP07018026.0申请日: 2007-09-13
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公开(公告)号: EP1921669B1公开(公告)日: 2015-09-02
- 发明人: Yifeng, Wu
- 申请人: Cree, Inc.
- 申请人地址: 4600 Silicon Drive Durham, NC 27703 US
- 专利权人: Cree, Inc.
- 当前专利权人: Cree, Inc.
- 当前专利权人地址: 4600 Silicon Drive Durham, NC 27703 US
- 代理机构: Brophy, David Timothy
- 优先权: US858851P 20061113
- 主分类号: H01L21/335
- IPC分类号: H01L21/335 ; H01L29/423 ; H01L29/778 ; H01L29/40 ; H01L29/812
摘要:
A transistor comprising an active region, with source and drain electrodes formed in contact with the active region and a gate formed between the source and drain electrodes and in contact with the active region. A first spacer layer is on at least part of the surface of the active region between the gate and the drain electrode and between the gate and the source electrode. The gate comprises a generally t-shaped top portion that extends toward the source and drain electrodes. A field plate is on the spacer layer and under the overhang of at least one section of the gate top portion. The field plate is at least partially covered by a second spacer layer, with the second spacer layer on at least part of the surface of the first active layer and between the gate and the drain and between the gate and the source. At least one conductive path electrically connects the field plate to the source electrode or the gate.
公开/授权文献
- EP1921669A1 GaN based HEMTs with buried field plates 公开/授权日:2008-05-14
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