发明授权
- 专利标题: NEGATIVE C-TYPE COMPENSATION FILM AND METHOD OF PREPARING THE SAME
- 专利标题(中): 负C补偿膜及其制造方法
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申请号: EP06798759.4申请日: 2006-09-13
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公开(公告)号: EP1924637B1公开(公告)日: 2012-08-22
- 发明人: LEE, Hyo-Sun , KIM, Dong-Ryul , KIM, Hee-Jung , NAM, Dae-Woo , RYU, Sang-Uk , JEONG, Boong-Goon , CHA, Ju-Eun , LEE, Ho-Jun
- 申请人: LG Chem, Ltd.
- 申请人地址: 20, Yoido-dong Youngdungpo-gu, Seoul 150-721 KR
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: 20, Yoido-dong Youngdungpo-gu, Seoul 150-721 KR
- 代理机构: HOFFMANN EITLE
- 优先权: KR20050085219 20050913
- 国际公布: WO2007032639 20070322
- 主分类号: C08J5/18
- IPC分类号: C08J5/18
摘要:
Disclosed are a negative C-type compensation film and a method of preparing the same. The negative C-type compensation film includes a) a base layer, and b) a polymer layer comprising polyarylate prepared by a method comprising the step of copolymerizing divalent phenols, divalent aromatic carboxylic acid halides, and allyl bisphenol derivatives, the base layer and the polymer layer being sequentially layered. The compensation film is capable of being used for the negative C-type compensation film without a stretching process, significantly reduces the thickness of the compensation film, and has significantly improved interlayer adhesion force in a multilayer structure.
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