发明公开
- 专利标题: Optical modeling apparatus
- 专利标题(中): Optische Modelliervorrichtung
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申请号: EP07123408.2申请日: 2007-12-17
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公开(公告)号: EP1935620A3公开(公告)日: 2010-07-07
- 发明人: Kihara, Nobuhiro , Yamamoto, Masanobu , Saito, Kimihiro , Aki, Yuichi , Yamasaki, Takeshi
- 申请人: Sony Corporation
- 申请人地址: 1-7-1 Konan, Minato-ku Tokyo 108-0075 JP
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: 1-7-1 Konan, Minato-ku Tokyo 108-0075 JP
- 代理机构: Körber, Martin Hans
- 优先权: JP2006346577 20061222
- 主分类号: B29C67/00
- IPC分类号: B29C67/00 ; B22F3/105
摘要:
There is provided an optical modeling apparatus (1) that forms a model of a desired shape by sequentially forming hardened layers by irradiating a light-curable resin with light. The apparatus includes a first light source (11) that emits a light beam for plotting on the resin, a scanning device (21,22) that scans the light beam from the first light source over the resin, a second light source (31) that emits light that irradiates one fixed region of the resin at a time, and a spatial light modulator (32) that spatially modulates the light from the second light source (33) to blanket-expose a specified region of the resin. The light beam from the scanning device (21,22) and the light from the spatial light modulator (32) form each hardened layer.
公开/授权文献
- EP1935620B1 Optical modeling apparatus and optical modeling method 公开/授权日:2012-10-24
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