It is an object of the present invention to obtain a discharge surface-treatment method and a discharge surface-treatment apparatus that are capable of performing treatment for forming a dense and relatively thick film. When a voltage is applied to the inter-electrode gap between a discharge electrode 21 and a workpiece 22 from a first power supply 23 and electric discharge occurs, a voltage for feeding a second discharge current of a current value higher than that of a first discharge current generated by the first power supply 23 is applied to the inter-electrode gap from a second power supply 28 for a short period to be superimposed on the first discharge current. Consequently, a discharge pulse current of a high current value and a short pulse width at least having rising speed equal to or higher than 40 A/µs flows to the inter-electrode gap. As a result, it is possible to melt only a necessary portion of an electrode material in a short time and include, at a high ratio, the electrode material melted in an electrode material moved to a workpiece side by thermal energy of electric discharge or a substance formed by combination of the electrode material. This makes it possible to form a film made of melted metal on a workpiece surface.