发明公开
- 专利标题： SYSTEM AND METHOD FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES BY THE IMPLANTATION OF CARBON CLUSTERS
- 专利标题（中）： 系统和方法用于生产半导体器件通过注入碳团簇
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申请号： EP06844937申请日： 2006-12-06
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公开(公告)号： EP1958245A4公开(公告)日： 2009-11-18
- 发明人: KRULL WADE A , HORSKY THOMAS N
- 申请人： SEMEQUIP INC
- 专利权人： SEMEQUIP INC
- 当前专利权人： SEMEQUIP INC
- 优先权： US74879705 2005-12-09
- 主分类号： H01L21/425
- IPC分类号： H01L21/425 ; H01L21/265
摘要：
A method of implanting ions is disclosed which comprises the steps of: (a) producing a volume of gas phase molecules of material of the form C n H x wherein n and x are integers, and n ‰¥ 2, and x ‰¥ 0; (b) ionizing the C n H x molecules to form C n H y + or C n H y - , wherein y is an integer such that y>0; and (c) accelerating the ionized molecules by an electric field into a target.
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