发明公开
- 专利标题: MULTI-BEAM KLYSTRON APPARATUS
- 专利标题(中): 多梁KLYSTRON设备
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申请号: EP06822949.1申请日: 2006-10-27
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公开(公告)号: EP1964146A1公开(公告)日: 2008-09-03
- 发明人: MIYAKE, Setsuo
- 申请人: Kabushiki Kaisha Toshiba , Toshiba Electron Tubes & Devices Co., Ltd.
- 申请人地址: 1-1, Shibaura 1-chome Minato-ku, Tokyo 105-8001 JP
- 专利权人: Kabushiki Kaisha Toshiba,Toshiba Electron Tubes & Devices Co., Ltd.
- 当前专利权人: Kabushiki Kaisha Toshiba,Toshiba Electron Tubes & Devices Co., Ltd.
- 当前专利权人地址: 1-1, Shibaura 1-chome Minato-ku, Tokyo 105-8001 JP
- 代理机构: Henkel, Feiler & Hänzel
- 优先权: JP2005317122 20051031
- 国际公布: WO2007052774 20070510
- 主分类号: H01J23/087
- IPC分类号: H01J23/087 ; H01J23/06
摘要:
The present invention provides a multi-beam klystron apparatus (11). In the above-described multi-beam klystron apparatus, the magnetic field generating element (52) of the electron-gun-unit-side magnetic field generating unit (41) is disposed around the electron gun unit (18), and a plurality of magnetic gaps (54, 55) are provided in the inner peripheral surface of the magnetic pole (53), which covers the magnetic field generating element, in the direction of travel of the electron beams. Therefore, lines of magnetic force, which are parallel to the center axis of the radio-frequency interaction unit (19), can be generated. Thus, even the electron beam, which is generated from the location apart from the center axis of the electron gun unit, can be guided to the radio-frequency interaction unit in the same manner as in the location at the canter axis of the electron gun unit.
公开/授权文献
- EP1964146B1 MULTI-BEAM KLYSTRON APPARATUS 公开/授权日:2013-01-16
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